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Au111 PECurve AlkaneFilm TriGlycineSulphate Polydimethylsiloxane Deposition Stiffness EvatecAG Memory MagneticForceMicroscopy Praseodymium epitaxy Non-ContactMode Trench FAPbI3 PVAC cooling ScanningSpreadingResistanceMicroscopy MagneticForce KevlarFiber Imprint BTO Reduction ReflexLens #Materials Piranha Dr.JurekSadowski light_emitting Chemical_Vapor_Deposition TransitionMetal aluminum_nitride LiftMode Ni-FeAlloy Melt dielectric trench
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MoS2 Layers on SiO2
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel Size: 256 × 256