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SolarCell PolyimideFilm Strontium EvatecAG FM_SKPM MembraneFilter Tungsten Roughness STO SThM PolymerPatterns BCZT PECurve semifluorinated alkane StyreneBeads FrequencyModulation GaN DOE GaAs NTU Domain Lateral_Force_Microscopy Sperm Cross-section NiFe LiquidImaging WPlug VortexCore Ucl temp_control Ito LightEmiting amplitude_modulation SiWafer Optoelectronic
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ExFoliated graphene on SiO₂/Si wafer
Scanning Conditions
- System : FX40
- Scan Mode: Non-Contact, Lithography
- Scan Rate : 1 Hz
- Scan Size : 10μm×10μm
- Pixel Size : 256×256
- Cantilever : PPP-EFM (k=2.8N/m, f=75kHz)
- Litho. Condition : Force 200nN, Writing speed 0.2 μm/s , AC bias 10 V @ 40 kHz, Humidity ~90% RH