-
Force-distance BiFeO3 ForceDistanceSpectroscopy TemperatureControlledAFM Pores small_scan MfmPhase China heterojunctions ElectroDeposition Platinum ScanningSpreadingResistanceMicroscopy Conducting piezoelectric force microscopy NanoLithography KAIST Materials FFM dielectric trench TemperatureControllerStage Friction vertical_PFM Hexylthiophene polyvinyl acetate STO Polydimethylsiloxane Solution ChemicalCompound Wildtype Phase Dr.JurekSadowski BiasMode PANI Domain HafniumDioxide
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
2L-MoS₂ (2/3)
Scanning Conditions
- System : FX40
- Sample bias: 0.5 V
- Scan Mode: C-AFM, LFM
- Scan Rate : 12 Hz
- Scan Size : 1μm×1μm
- Pixel Size : 512×512
- Cantilever : ElectricMulti75-G (k=3N/m, f=75kHz)