-
multi_layer Singapore PvdfBead fluoroalkane HACrystal Moire PolycrystallineFerroelectricBCZT CeramicCapacitor LiftMode MLCC ChemicalCompound fifber Polystyrene HydroGel Ecoli Optoelectonics hydrocarbon ThermalDetectors Memory InorganicCompound Electrical&Electronics doped Gallium dichalcogenide Permalloy cannabinoid FrictionalForce TempControl Graphene OxideLayer Conducting Corrosion SetpointMode Strontium Neodymium
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
MoSi₂ Hard defect repair
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 6μm, 0.5μm×1μm
- Pixel Size : 512×64 for 6μm2, 512×34 for 0.5μm×1μm