-
temp_control non_contact CntFilm HexacontaneFilm MBE HanyangUniv PetruPoni_Institute Electronics I-VSpectroscopy Conduct Polarization Yeditepe_University ElectroDeposition Pinpoint Techcomp GranadaUniv Au111 CarbonNanotube Polyurethane Boron thermoplastic_elastomers Phthalocyanine LiftHeight Genetic AdhesionEnergy AtomicSteps Styrene Composite ThermalDetectors GlassTemperature Tapping heterojunctions PolyvinylideneFluoride PinpointPFM atomic_steps
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256