Park Systems le invita asistir al Workshop en Microscopía de Fuerza Atómica.

Fecha :Agosto 26, 2022
Lugar :Instituto de Física, UNAM
Circuito de la Investigación Científica Ciudad Universitaria CP 04510 CDMX, México

Training Workshop on AFM

Atomic Force Microscopy and the latest development

Date: 1 March, 2022

Time: 10:00 a.m.

This training workshop introduces to the attendee basic working principle of AFM, and training on using the Park System AFM machines.

Objectives;
a) To understand the theory of contact, non-contact and tapping mode atomic force microscopy and its application
b) To be trained in standard test and operating an Atomic Force Microscopy system.
c) To interprete the topography and properties of surface of a sample.

THE LATE-NIGHT AFM WORKSHOP

Advances in Materials Nanocharacterization and Material Analysis: Exploring the Potential of the Sideband KPFM Mode

Date: 8 March, 2022

Time: 21:00 p.m.

Place: Le forum des microscopies à sonde locale

We will showcase the capabilities of the NX10 Research AFM, and the recently launched Park FX40 Automatic AFM with the innovative automation feature for more efficient nano-investigation, including wide range of nanomechanical, magnetic and electrical material characterization modes with a focus on new generation KPFM mode!

New hybrid metrology solutions using advances in automated Atomic Force Microscopy,

SEMICON EUROPA 2021, Munich, Germany

Date: Tuesday, November 16 – Friday, November 19, 2021

Time: 12:00 pm

Place: Neue Messe München, Munich, Germany

Enjoy the lunch snacks and the seminar on: “New hybrid metrology solutions using advances in automated Atomic Force Microscopy,” presented by Haneol Cho, industrial application scientist at Park Systems Europe, every Semicon day at 12:00 pm.

In the 30-minutes presentation, we will be revealing new hybrid nanotechnology techniques that provide a holistic pool of information meeting an even broader range of needs and requirements of semiconductor business like imaging narrow or deep trenches, sidewalls, undercuts, layer thicknesses, defect review, hot spot detection, or imaging material properties locally, and more!

The LUNCHEON is open to everyone and is FREE of charge.

This focused workshop series will provide an opportunity to Design, Process, Metrology, Yield and Failure Analysis Engineers to interface directly with Park Systems’ advanced applications experts and discuss day-to-day nanoscale solutions that address device manufacturing challenges.

Nanoscale Solutions for Design and Manufacturing of Electronic Devices – a digital workshop series

Register for the first workshop , held on June 25th

WHY PARK SYSTEMS ATOMIC FORCE MICROSCOPES

• • Leader in Automated AFM Equipment
• • Industry's sole non-destructive inspection and metrology technology, bundled in a single instrument
• • Lower in-fab costs compared to individual inspection or metrology tools
• • Fully-automated fleet matching tools enable day-to-day solutions for manufacturing yield challenges
• • The choice of many of the top 20 Semiconductor Manufacturers

WHY PARK SYSTEMS ATOMIC FORCE MICROSCOPES

• • Device Scaling and Novel Structure Designs
• • Process Advancements to Enable High Volume Manufacturing Solutions
• • Inspection and Metrology Methods to Capture Yield Excursion
• • Packaging and Reliability Considerations.