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Lattice Polydimethylsiloxane Crystal light_emitting #EC lithography Dr.JurekSadowski KevlarFiber Force-distance DiffractiveOpticalElements Au111 Electrical&Electronics medical flakes Spincast AtomicLayer Hexylthiophene Aluminium_Oxide solar_cell Chromium hard_disk Memory PvdfFilm Molybdenum_disulfide ThinFilm Croatia Domain exfoliate Polyimide thermal_conductivity FuelCell ImideMonomer SingleCrystal Christmas #Materials
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Photoresist pattern (post-development process)
Scanning Conditions
- System : NX-3DM
- Scan Mode: Non-contact
- Scan Rate : 0.1 Hz
- Scan Size : 2μm×10μm
- Pixel Size : 512×2048
- Cantilever : EBD-R2-NCLR (k=45N/m, f=190kHz)