-
Lateral_Force_Microscopy AEAPDES WS2 Ceramic FastScan Lanthanum_aluminate Heat NanoLithography DentalProsthesis Subhajjit Biology P3HT SiWafer Materials Ni-FeAlloy PS_LDPE BloodCell Resistance Reduction LiBattery Phosphide Zagreb margarine Semiconductor biocompatible nanomechanical Barium_titanate PMNPT ConductingPolymer Copper C36H74 Ni81Fe19 HardDisk Trench Chemical_Vapor_Deposition
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Semiconductor device, W-plug
Scanning Conditions
- System: NX10
- Scan Mode: Conductive AFM
- Cantilever: ElectriMulti75-G (k=3N/m, f=75kHz)
- Scan Size: 2μm×1μm
- Scan Rate: 0.3Hz
- Pixel: 512×256
- Sample bias: +1V