-
Scratch Adhesion PFM Bismuth Polyimide Chromium LateralForceMicroscopy HiVacuum Phase InsulatorFilm CntFilm Au111 SiliconCrystal atomic_steps SKPM Reading ElectroChemical Liquid Biofilm Indent Nanofiber Tapping FastScan Polarization CeNSE_IISc Mechanical OrganicSemiconductor solar_cell PolycrystallineFerroelectricBCZT Epoxy ThermalProperties Praseodymium Temperature ItoGlass Polyurethane
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256