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FrictionForce Patterns Terrace blended polymers SICM OrganicSemiconductor CrossSection Tungsten_disulfide frequency_modulation Etch Vac LateralForceMicroscopy Pipette Litho PhaseImaging Sio2 PECurve Foil AnodizedAluminumOxide FM-KPFM SiliconeOxide Crystal neodymium_magnets TemperatureControl align Step dielectric_trench Resistance cannabis BloodCell CaMnO3 Tin disulfide CrAu SiliconCrystal Calcium
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ExFoliated graphene on SiO₂/Si wafer
Scanning Conditions
- System : FX40
- Scan Mode: Non-Contact, Lithography
- Scan Rate : 1 Hz
- Scan Size : 10μm×10μm
- Pixel Size : 256×256
- Cantilever : PPP-EFM (k=2.8N/m, f=75kHz)
- Litho. Condition : Force 200nN, Writing speed 0.2 μm/s , AC bias 10 V @ 40 kHz, Humidity ~90% RH