-
Ananth Treatment CP-AFM Materials molecular_self_assembly FFM Conduct Graphite IVSpectroscopy NCM thermoplastic_elastomers ForceVolume Glass MBE FM_KPFM Microchannel Beads BiasMode IcelandSpar UnivOfMaryland Topography PvdfFilm Polystyrene Hole temperature controller AFM Ferroelectric Phenanthrene GaAs Tungsten_disulfide chemical_compound TappingMode CNT Tungsten LiftMode WPlug
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256