-
MagneticPhase FloppyDisk sputter Phosphide FAPbI3 Protein 2d_materials CeramicCapacitor strontiu_titanate Au111 PVAP3HT Conducting Aluminium_Oxide VortexCore Dopped OxideLayer Nickel DOE FrequencyModulation blended polymers Led Topography epitaxy NCM\ Praseodymium KAIST Indent Filter SPMLabs NiFe Molybdenum BiasMode PatternedSapphireSubstrat Styrene LateralForceMicroscopy
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Christmas Ball Lithography on Si
Create oxidation layers on bare Si surface using bias mode of lithography.
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area