-
Phthalocyanine silicon_oxide dichalcogenide Alkane MESA structure Dopped Solution GlassTemperature Memory align CNT mechanical property Korea CuSubstrate Calcium LFM Inorganic_Compound Silver C_AFM CHRYSALIS_INC mfm_amplitude FailureAnalysis Polymer membrane KelvinProbeForceMicroscopy InsulatorFilm Wang MfmAmplitude GlassTemp YszSubstrate ScanningThermalMicroscopy Sadowski Liquid 3-hexylthiophene TappingMode
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on MESA
Top dielectric trench etch profile on MESA on Si wafer.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256