Park Systems offers a selection of advanced modes that can provide not only topographic imaging but also characterization measurements with respect to the dielectric and piezoelectric property of the sample. These modes include Enhanced Electric Force Microscopy (Enhanced EFM), Dynamic Contact Electric Force Microscopy (DC-EFM), and Piezoelectric Force Microscopy (PFM).

Enhanced Electric Force Microscopy (EFM)

The Enhanced EFM mode of Park AFM offers four separate options: Standard EFM, Dynamic-Contact EFM (DC-EFM), Piezoelectric Force Microscopy (PFM), and Kelvin Probe Force Microscopy (KPFM). The movement of a cantilever is influenced by the electric force between cantilever and sample; cantilever displacement can be analyzed for potential, charge, or electric domains.

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Dynamic Contact EFM (DC-EFM)*

DC-EFM is capable of extremely high definition EFM results. Patented by Park Systems, DC-EFM actively applies an AC voltage bias to the cantilever and detects the amplitude and the phase change of the cantilever modulation with respect to the applied bias. DC-EFM provides the ability to monitor the second harmonic of the modulation which can be compared to the capacitance of a sample and enhances the electric force signal from the background intermolecular force.

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Piezoelectric Force Microscopy (PFM)*

Park Systems’ patented PFM mode accurately measures electric domain structures such as polarity in ferroelectric or piezoelectric samples. This mode includes independent control of an applied AC and DC bias, and local amplitude/phase vs. DC bias spectroscopy.

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Piezoelectric Response Spectroscopy

The Piezoelectric Response Spectroscopy mode of Park AFM measures the local amplitude/phase response to a DC bias between tip and sample surface. The polarity of local piezoelectric domain switches depend on the sign and amount of applied voltage.

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